Chip Targets Incorporated has two in-house Focus Ion Beam (FIB) machines:  The FEI Strata 400S is a FIB/SEM column and the FEI V600FIB.

The FEI Strata 400S System Capabilities and Specifications:

  • Electron column with Schottky FEG, 350v-30kV
  • In lens SE and BSE detector
  • STEM with OmniProbe Liftout
  • Magnum ion column, 5–30kV
  • CDEM with 7nm image resolution

The FEI V600 System Capabilities and Specifications:

  • Front side and Back side FIB edits
  • Chamber size: 8in wafer
  • Stage movement: 6 in wafer
  • Beam Resolution: 5nm
  • Variable Beam Voltage: 8kV to 30kV
  • Camelot Cad Navigation
  • 32 nm copper technology
  • Gases: W Deposition, Insulator Enhanced Etch (XeF2), Enhanced Etch (Iodine), Insulator Depostion, CuRX