Chip Targets Incorporated has two in-house Focus Ion Beam (FIB) machines: The FEI Strata 400S is a FIB/SEM column and the FEI V600FIB.
The FEI Strata 400S System Capabilities and Specifications:
- Electron column with Schottky FEG, 350v-30kV
- In lens SE and BSE detector
- STEM with OmniProbe Liftout
- Magnum ion column, 5–30kV
- CDEM with 7nm image resolution
The FEI V600 System Capabilities and Specifications:
- Front side and Back side FIB edits
- Chamber size: 8in wafer
- Stage movement: 6 in wafer
- Beam Resolution: 5nm
- Variable Beam Voltage: 8kV to 30kV
- Camelot Cad Navigation
- 32 nm copper technology
- Gases: W Deposition, Insulator Enhanced Etch (XeF2), Enhanced Etch (Iodine), Insulator Depostion, CuRX
